Ideal Vacuum Circular Magnetron Sputtering Targets, SILICON DIOXIDE- SiO₂ Sputtering Target, 3'' Diameter x 0.125" Thick, 99.995 Percent Purity, Metallic Bonded to a OFHC Copper Backing Plate

This product is a circular magnetron SILICON DIOXIDE- SiO₂ sputtering target, with a 3'' diameter x 0.125" thickness. It is 99.995% pure, and is metallically bonded to a OFHC (Oxygen-Free High Conductivity) copper backing plate.

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SILICON DIOXIDE - SiO₂

Silicon Dioxide (SiO₂ ) is one of the most commonly used materials in thin-film coatings due to its excellent optical, dielectric, and protective properties. Here’s a concise summary of SiO₂ in thin films:

1. Refractive Index: Refractive Index: ~1.45 (at 550 nm), making it a low-index material. It is widely used in optical coatings, such as anti-reflective coatings and dielectric mirrors, where a low refractive index layer is required.

2. Optical Transparency: Transmission Window: SiO₂ has a broad transparency range, from the ultraviolet (UV) (~160 nm) to the infrared (IR) (~2.5 µm). This makes it an ideal material for coatings in the visible, UV, and IR spectral ranges.

3. Dielectric Properties: Low Dielectric Constant: SiO₂ has a relatively low dielectric constant (~3.9), which makes it useful as an insulating layer in microelectronics and semiconductors. It serves as an effective dielectric barrier in devices like MOSFETs.

4. Chemical and Thermal Stability: SiO₂ is chemically inert, making it highly resistant to corrosion and oxidation. It has excellent thermal stability, allowing it to withstand high temperatures in various applications.

5. Mechanical Properties: SiO₂ is hard and offers good abrasion resistance, making it a protective material in thin-film coatings. However, it is brittle, and care must be taken in applications involving mechanical stress.

6. Deposition Methods: SiO₂ thin films can be deposited using various techniques, including RF sputtering, chemical vapor deposition (CVD), thermal evaporation, and electron-beam deposition. RF sputtering is commonly used for thin, uniform coatings of SiO₂ .

7. Applications: Optical Coatings: SiO₂ is widely used in anti-reflective coatings, high/low index multilayer coatings, and as protective coatings for optics. Microelectronics: SiO₂ serves as an insulating layer in integrated circuits, passivation layers, and as a gate oxide in MOSFETs. Protective Coatings: Due to its chemical stability and hardness, SiO₂ is used in protective and wear-resistant coatings. Barrier Layers: SiO₂ is effective as a diffusion barrier and moisture protection layer in various applications.

Summary: SiO₂ is a low-refractive-index material with broad optical transparency, excellent dielectric properties, and strong chemical stability, making it highly versatile in optical coatings, electronics, and protective layers. Its durability and wide transmission range are key factors in its broad use in thin films across industries.

Notes:
Metallic or elastomer backing plate bonding is recommended for all dielectric target materials because these materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity. These targets are most susceptible to thermal shock due to their low thermal conductivity and hence, may require specific power ramp up and ramp down procedures during start up and shut down steps.