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NEW ITEM

Ideal Vacuum Circular Magnetron Sputtering Targets, SILICON DIOXIDE- SiO2 Sputtering Target, 3'' Diameter x 0.125" Thick, 99.995 Percent Purity, Metallic Bonded to a OFHC Copper Backing Plate

Condition:
  New
Part Number:
  P1013715
Warranty:
  Full Manufacturer's Warranty

Available Now   1  

Sale: £718.90

Ideal Vacuum Circular Magnetron Sputtering Targets, SILICON DIOXIDE- SiO2 Sputtering Target, 3'' Diameter x 0.125" Thick, 99.995 Percent Purity, Metallic Bonded to a OFHC Copper Backing Plate 718.9
Currency: Pound Sterling (GBP)

Description

Ideal Vacuum Circular Magnetron Sputtering Targets, SILICON DIOXIDE- SiO2 Sputtering Target, 3'' Diameter x 0.125" Thick, 99.995 Percent Purity, Metallic Bonded to a OFHC Copper Backing Plate.
Ideal Vacuum Products, LLC.

This product is a circular magnetron SILICON DIOXIDE- SiO2 sputtering target, with a 3'' diameter x 0.125" thickness. It is 99.995% pure, and is metallically bonded to a OFHC (Oxygen-Free High Conductivity) copper backing plate.

We use a very competitive pricing strategy to ensure you receive the highest quality products at the best possible value, giving you both affordability and excellence in every purchase. We offer huge discounts to every customer, customers who place bulk orders will enjoy huge savings. We stock huge quantities of our products to give our customers guaranteed same day shipping after placing an order. This short lead time is loved by all our customers who look to manage their cash flow with quicker turnaround times. Our regular customers can maintain lower inventory levels, decreasing storage costs and minimizing the risk of obsolescence. Buying from Ideal Vacuum means a customer receives their product more quickly, enhancing satisfaction and meeting their urgent needs. This also enables our customers to stay ahead of their competition by quickly adapting to new trends and demands.

SILICON DIOXIDE - SiO2

Silicon Dioxide (SiO2 ) is one of the most commonly used materials in thin-film coatings due to its excellent optical, dielectric, and protective properties. Here’s a concise summary of SiO2 in thin films:

1. Refractive Index: Refractive Index: ~1.45 (at 550 nm), making it a low-index material. It is widely used in optical coatings, such as anti-reflective coatings and dielectric mirrors, where a low refractive index layer is required.

2. Optical Transparency: Transmission Window: SiO2 has a broad transparency range, from the ultraviolet (UV) (~160 nm) to the infrared (IR) (~2.5 µm). This makes it an ideal material for coatings in the visible, UV, and IR spectral ranges.

3. Dielectric Properties: Low Dielectric Constant: SiO2 has a relatively low dielectric constant (~3.9), which makes it useful as an insulating layer in microelectronics and semiconductors. It serves as an effective dielectric barrier in devices like MOSFETs.

4. Chemical and Thermal Stability: SiO2 is chemically inert, making it highly resistant to corrosion and oxidation. It has excellent thermal stability, allowing it to withstand high temperatures in various applications.

5. Mechanical Properties: SiO2 is hard and offers good abrasion resistance, making it a protective material in thin-film coatings. However, it is brittle, and care must be taken in applications involving mechanical stress.

6. Deposition Methods: SiO2 thin films can be deposited using various techniques, including RF sputtering, chemical vapor deposition (CVD), thermal evaporation, and electron-beam deposition. RF sputtering is commonly used for thin, uniform coatings of SiO2 .

7. Applications: Optical Coatings: SiO2 is widely used in anti-reflective coatings, high/low index multilayer coatings, and as protective coatings for optics. Microelectronics: SiO2 serves as an insulating layer in integrated circuits, passivation layers, and as a gate oxide in MOSFETs. Protective Coatings: Due to its chemical stability and hardness, SiO2 is used in protective and wear-resistant coatings. Barrier Layers: SiO2 is effective as a diffusion barrier and moisture protection layer in various applications.

Summary: SiO2 is a low-refractive-index material with broad optical transparency, excellent dielectric properties, and strong chemical stability, making it highly versatile in optical coatings, electronics, and protective layers. Its durability and wide transmission range are key factors in its broad use in thin films across industries.





Notes:
Metallic or elastomer backing plate bonding is recommended for all dielectric target materials because these materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity. These targets are most susceptible to thermal shock due to their low thermal conductivity and hence, may require specific power ramp up and ramp down procedures during start up and shut down steps.

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CONTACT US
Ideal Vacuum Products , LLC
5910 Midway Park Blvd NE
Albuquerque, New Mexico 87109-5805 USA

Phone: (505) 872-0037
Fax: (505) 872-9001
info@idealvac.com



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