Edwards iXH 100 HARSH Dry Vacuum Pump 200-230 VAC 50/60 hz 3 ph. Edwards Part Number AC010A121000. The Edwards iXH 100 is a new range of dry pumps built for green manufacturing and the processing of harsh chemical processes. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation of dry pumps, reducing environmental impact and lowering cost of ownership. Gas barrier technology and thermal design improvements enable four times greater corrosion resistance than iH Series product. Advanced powder handling features mean iXH will deliver maximum reliability and extended pump life for multi-layer etch processes and reduced power consumption for CVD processes especially with HARSH Chemicals. The Edwards iXH 100 Series Pumps are compact and of light-weight design, combined with exceptionally low noise and vibration, makes iXH the most versatile chemical dry pump in the Edwards range. iXH will transform your expectations of dry vacuum pump technology, deliver real benefits and increased uptime, with minimal environmental impact. iXH pumps are designed for use in most semiconductor processes while delivering significant reductions in input power. This model DOES NOT have a booster blower pump for added performance. For complete Instruction Manual see DOWNLOADS.FEATURES and BENEFITS: Primarily for HARSH Chemical Applications Peak Pumping Speed 100 m3/h-1 (59 CFM) Ultimate Pressure 1.5 X 10-2 Torr No preventative maintenance required Contains Primary Pump Only 3/8 inch Quick Connect Water Fillings Water & Power Connection Mating Halves SS Water Cooling System Multi Mode 44 slm Gas ModuleAPPLICATIONS: Load Lock Transfer Meteorology Lithography Physical Vapor Deposition PVD Process Physical Vapor Deposition PVD Pre-clean Rapid Thermal Anneal RTA Strip/Ashing Etching Implant Source High-Density Plasma Chemical Vapor Deposition HDP CVD Rapid Thermal Processing RTP Sub-Atmospheric Chemical Vapor Deposition SACVD Tungsten Chemical Vapor Deposition WCVD Modified Chemical-Vapor Deposition MCVD Plasma-Enhanced Chemical Vapor Deposition PECVD Low Pressure Chemical Vapor Deposition LPCVD

Edwards iXH 610 HARSH Dry Vacuum Pump 200-230 VAC 50/60 hz 3 ph. Edwards Part Number AC110A121100. The Edwards iXH 610 is a new range of dry pumps built for green manufacturing and the processing of harsh chemical processes. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation of dry pumps, reducing environmental impact and lowering cost of ownership. Gas barrier technology and thermal design improvements enable four times greater corrosion resistance than iH Series product. Advanced powder handling features mean iXH will deliver maximum reliability and extended pump life for multi-layer etch processes and reduced power consumption for CVD processes especially with HARSH Chemicals. The Edwards iXH 610 Series Pumps are compact and of light-weight design, combined with exceptionally low noise and vibration, makes iXH the most versatile chemical dry pump in the Edwards range. iXH will transform your expectations of dry vacuum pump technology, deliver real benefits and increased uptime, with minimal environmental impact. iXH pumps are designed for use in most semiconductor processes while delivering significant reductions in input power. For complete Instruction Manual see DOWNLOADS. FEATURES and BENEFITS: Primarily for HARSH Chemical Applications Peak Pumping Speed 665 m3/h-1 (391 CFM) Ultimate Pressure 3.7 X 10-3 Torr No preventative maintenance required 3/8 inch Quick Connect Water Fillings Water & Power Connection Mating Halves SS Water Cooling System Multi Mode 44 slm Gas Module APPLICATIONS: Load Lock Transfer Meteorology Lithography Physical Vapor Deposition PVD Process Physical Vapor Deposition PVD Pre-clean Rapid Thermal Anneal RTA Strip/Ashing Etching Implant Source High-Density Plasma Chemical Vapor Deposition HDP CVD Rapid Thermal Processing RTP Sub-Atmospheric Chemical Vapor Deposition SACVD Tungsten Chemical Vapor Deposition WCVD Modified Chemical-Vapor Deposition MCVD Plasma-Enhanced Chemical Vapor Deposition PECVD Low Pressure Chemical Vapor Deposition LPCVD

Edwards iXH 1210H HARSH Dry Vacuum Pump 200-230 VAC 50/60 hz 3 ph. Edwards Part Number AC3A0A122200 The Edwards iXH 1210H is a new range of dry pumps built for green manufacturing and the processing of harsh chemical processes. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation of dry pumps, reducing environmental impact and lowering cost of ownership. Gas barrier technology and thermal design improvements enable four times greater corrosion resistance than iH Series product. Advanced powder handling features mean iXH will deliver maximum reliability and extended pump life for multi-layer etch processes and reduced power consumption for CVD processes especially with HARSH Chemicals. The Edwards iXH 1210H Series Pumps are compact and of light-weight design, combined with exceptionally low noise and vibration, makes iXH the most versatile chemical dry pump in the Edwards range. iXH will transform your expectations of dry vacuum pump technology, deliver real benefits and increased uptime, with minimal environmental impact. iXH pumps are designed for use in most semiconductor processes while delivering significant reductions in input power. For complete Instruction Manual see Downloads to the side.FEATURES and BENEFITS: Primarily for HARSH Chemical Applications Peak Pumping Speed 1025 m3/h-1 (603 CFM) Ultimate Pressure 5.0 X 10-3 Torr No preventative maintenance required 3/8 inch Quick Connect Water Fillings Water & Power Connection Mating Halves SS Water Cooling System Multi Mode 44 slm Gas Module APPLICATIONS: Load Lock Transfer Meteorology Lithography Physical Vapor Deposition PVD Process Physical Vapor Deposition PVD Pre-clean Rapid Thermal Anneal RTA Strip/Ashing Etching Implant Source High-Density Plasma Chemical Vapor Deposition HDP CVD Rapid Thermal Processing RTP Sub-Atmospheric Chemical Vapor Deposition SACVD Tungsten Chemical Vapor Deposition WCVD Modified Chemical-Vapor Deposition MCVD Plasma-Enhanced Chemical Vapor Deposition PECVD Low Pressure Chemical Vapor Deposition LPCVD

Edwards iXH 1220H HARSH Dry Vacuum Pump 200-230 VAC 50/60 hz 3 ph. Edwards Part Number AC3B0A122200 The Edwards iXH 1220H is a new range of dry pumps built for green manufacturing and the processing of harsh chemical processes. Using very low energy the efficient roots mechanism has been developed to dramatically reduce input power to 1.3 kW, 60% lower than the previous generation of dry pumps, reducing environmental impact and lowering cost of ownership. Gas barrier technology and thermal design improvements enable four times greater corrosion resistance than iH Series product. Advanced powder handling features mean iXH will deliver maximum reliability and extended pump life for multi-layer etch processes and reduced power consumption for CVD processes especially with HARSH Chemicals. The Edwards iXH 1220H Series Pumps are compact and of light-weight design, combined with exceptionally low noise and vibration, makes iXH the most versatile chemical dry pump in the Edwards range. iXH will transform your expectations of dry vacuum pump technology, deliver real benefits and increased uptime, with minimal environmental impact. iXH pumps are designed for use in most semiconductor processes while delivering significant reductions in input power. For complete Instruction Manual see Downloads to the side.FEATURES and BENEFITS: Primarily for HARSH Chemical Applications Peak Pumping Speed 1200 m3/h-1 (645 CFM) Ultimate Pressure 3.7 X 10-3 Torr No preventative maintenance required 3/8 inch Quick Connect Water Fillings Water & Power Connection Mating Halves SS Water Cooling System Multi Mode 44 slm Gas Module APPLICATIONS: Load Lock Transfer Meteorology Lithography Physical Vapor Deposition PVD Process Physical Vapor Deposition PVD Pre-clean Rapid Thermal Anneal RTA Strip/Ashing Etching Implant Source High-Density Plasma Chemical Vapor Deposition HDP CVD Rapid Thermal Processing RTP Sub-Atmospheric Chemical Vapor Deposition SACVD Tungsten Chemical Vapor Deposition WCVD Modified Chemical-Vapor Deposition MCVD Plasma-Enhanced Chemical Vapor Deposition PECVD Low Pressure Chemical Vapor Deposition LPCVD

Edwards GX, iGX, iXH, iXM, and iXL Pump Display Terminal, 5Way, XLR Plug, Hand Held Key Pad Display Module. Edwards Part Number: D37280700 Edwards GX, iGX, iXH, IXM, and iXL Pump Display Terminal 5 Way XLR Plug. Hand held display for Edwards GX, iGX and iXL120 Series Dry Pump Systems with 5 way XLR connection. Edwards Vacuum Part Number D37280700.

Edwards LAM Alliance Micro TIM ModuleD37360350LAM Alliance MicroTIM provides a tool interface to LAM Alliance platforms for dry pumps with a MicroTIM slot. A LAM Alliance Micro TIM module may be used to provide control and monitoring of a variety of Edwards pumps by your Process Tool, using the parallel digital interface. The LAM Alliance Micro TIM is compatible with the following Edwards pumps. EPX Series iGX Series GX Series iXH Series iXL Series Also for use on multi pump systems with a System Controller. Where these modules already exist they may be utilized to provide control and monitoring of the pump by your Process Tool or other control equipment. Check the Micro TIM or iTIM manuals.pdf in our downloads section to the left for parallel connection input and compatibility information.

Edwards SPI Micro TIM ModuleD37360310SPI Micro TIM module provides Edwards SPI tool interface for dry pumps with a Micro TIM slot. A SPI Micro TIM module may be used to provide control and monitoring of a variety of Edwards pumps by your Process Tool, using the parallel digital interface. The SPI Micro TIM is compatible with the following Edwards pumps. EPX Series iGX Series GX Series iXH Series iXL Series Also for use on multi pump systems with a System Controller. Where these modules already exist they may be utilized to provide control and monitoring of the pump by your Process Tool or other control equipment. Check the Micro TIM or iTIM manuals.pdf in our downloads section to the left for parallel connection input and compatibility information.

Edwards MCM Micro TIM ModuleD37360320MCM MicroTIM module provides Edwards MCM tool interface for dry pumps with a MicroTIM slot. A MCM Micro TIM module may be used to provide control and monitoring of a variety of Edwards pumps by your Process Tool, using a parallel digital interface. The MCM Micro TIM is compatible with the following Edwards pumps. EPX Series iGX Series GX Series iXH Series iXL Series GXS Series(MCM Version only) CXS Series(MCM version only) Where these modules already exist they may be utilized to provide control and monitoring of the pump by your Process Tool or other control equipment. For example a pump may be upgraded from an iH to an iHs without changing the interface module. The MCM Micro TIM has AUC compatibility with GXS and CXS series pumps. Equivalent to iH iTIM D37422000 - MCM. Check the Micro TIM or iTIM manuals.pdf in our downloads section to the left for parallel connection input and compatibility information.

Edwards TEL Micro TIM ModuleD37360330TEL Micro TIM module provides Edwards TEL tool interface for dry pumps with a Micro TIM slot. A TEL Micro TIM module may be used to provide control and monitoring of a variety of Edwards pumps by your Process Tool, using the parallel digital interface. The TEL Micro TIM is compatible with the following Edwards pumps. EPX Series iGX Series GX Series iXH Series iXL Series Also for use on multi pump systems with a System Controller. Where these modules already exist they may be utilized to provide control and monitoring of the pump by your Process Tool or other control equipment. Check the Micro TIM or iTIM manuals.pdf in our downloads section to the left for parallel connection input and compatibility information.

Edwards Semi E73 Micro TIM ModuleD37360340Semi E73 Micro TIM module provides Semi E73 compliant tool interface for dry pumps with a MicroTIM slot. A Semi E73 Micro TIM module may be used to provide control and monitoring of a variety of Edwards pumps by your Process Tool, using the parallel digital interface. The Semi E73 Micro TIM is compatible with the following Edwards pumps. EPX Series iGX Series GX Series iXH Series iXL Series Also for use on multi pump systems with a System Controller. Where these modules already exist they may be utilized to provide control and monitoring of the pump by your Process Tool or other control equipment. Check the Micro TIM or iTIM manuals.pdf in our downloads section to the left for parallel connection input and compatibility information.

Edwards Novellus C3 Micro TIM ModuleD37360360Novellus C3 Micro TIM provides a tool interface to Novellus C3 platforms for dry pumps with a MicroTIM slot. A Novellus C3 Micro TIM module may be used to provide control and monitoring of a variety of Edwards pumps by your Process Tool, using the parallel digital interface. The Novellus C3 Micro TIM is compatible with the following Edwards pumps. EPX Series iGX Series GX Series iXH Series iXL Series Also for use on multi pump systems with a System Controller. Where these modules already exist they may be utilized to provide control and monitoring of the pump by your Process Tool or other control equipment. Check the Micro TIM or iTIM manuals.pdf in our downloads section to the left for parallel connection input and compatibility information.

Edwards Hitachi Micro TIM ModuleD37360370Hitachi MicroTIM provides Hitachi tool interface for dry pumps with a MicroTIM slot. A Hitachi Micro TIM module may be used to provide control and monitoring of a variety of Edwards pumps by your Process Tool, using the parallel digital interface. The Hitachi Micro TIM is compatible with the following Edwards pumps. EPX Series iGX Series GX Series iXH Series iXL Series Also for use on multi pump systems with a System Controller. Where these modules already exist they may be utilized to provide control and monitoring of the pump by your Process Tool or other control equipment. Check the Micro TIM or iTIM manuals.pdf in our downloads section to the left for parallel connection input and compatibility information.

Edwards Power Connector Kit Used to Make Power Cable for iXH Vacuum Pumps. This is a Edwards iXH dry semiconductor pump plug kit to make input mains power cable for Edwards iXH series semiconductors vacuum pumps. Works with iXH100, iXH610, iXH1210H, iXH1220H, and other models.

Edwards iXH Input Power Connector, Used to Make Power Cable. Edwards Part Number: D37480075 This is a Edwards iXH dry semiconductor pump input power connector, it can be used to make input mains power cable. Works with iXH100, iXH610, and other models. Edwards Part Number: D37480075.

Edwards EMO Cable for Installing A New-Style iXL or iXH Series Dry Semiconductor Pump On A Tool With Existing Old-Style iH Series Pumps. Ideal Vacuum supplies our own interface cable, which allows replacement of an older style iH series pump with the style IXL120N, iXH100, or iXH610. This EMO cabling is useful for applications where a semiconductor tool has multiple old style iH pumps attached in the sub fab. This interface module cable continues the EMO circuit across the remaining old-style iH pumps and through the new style iXL120N replacement pump. The connections and different interface modules are described in detail below. This cable is typically connected from P2 (output) of iTIM on left side iH, to Emergency Stop (EMS) connector on iXL120N, to J1 (input) of iTIM on right side iH pump (see details in our Application Note in pdf format). The issue is that the Edwards iH series pumps are now discontinued and no longer available. Ideal Vacuum stocks the replacement pumps, iXL120N for load lock, iXH100 (replaces iH80), iXH610 (replaces iH600), and so on. The new iXL120N pump does not have an EMO button on the front like the old style IH pumps (see details in our Application Note). The Edwards iTIM was often configured with older style Edwards iH series dry semiconductor vacuum pumps where multiple pumps are connected to a single semiconductor tool in the sub-fab. The EMO cabling is set up to shut down the tool if an EMO is pressed on any of the iH series pumps, they are typically cabled in series, in a daisy chain configuration.