Pfeiffer Vacuum H2O+N2 FACILITIES 2 PUMPS 2, Pfeiffer-Adixen Dry Multi-Stage Roots Vacuum Pumps, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps,  PN  805761

These Pfeiffer Vacuum H2O+N2 FACILITIES 2 PUMPS 2  have part number 805761, are new, and come with full Pfeiffer Vacuum warranty. The Pfeiffer Adixen medium duty A3P series semiconductor dry vacuum pumps are based on the proven multi-stage Roots technology. The inside of the pumps is resistant to corrosive gases. For this reason, the pumps have high reliability on medium duty processes. The three available models from the series offer a wide spectrum of pumping speeds and thereby cover most requirements for medium duty vacuum pumps in the semiconductor industry. The Pfeiffer Adixen A3P series is suitable for operation in a clean room and complies with CE and Semi S2 standards.

The dry pumps are distinguished through their high reliability for applications in medium duty processes. The pumps from the series have a temperature sensor and inert gas flushing. A low noise emission and low vibration level are further characteristics of the Pfeiffer Adixen A3P series.

The Pfeiffer Adixen ADH, A4H, and A4X harsh processes series dry semiconductor vacuum pumps are chemical processes used, for example, in the semiconductor and coating industries. These processes are harsh because primarily aggressive and corrosive mediums are used and processed under vacuum. These mediums have the highest requirements for the design and quality of the process systems. Typical harsh duty processes are etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) as well as metal organic chemical vapor deposition (MOCVD).

Since aggressive and corrosive chemicals are used in harsh duty processes, the vacuum pumps and components must be corrosion-resistant. In the applications of the semiconductor and coating industries, there is frequently an increased occurrence of powder, which may lead to accumulation in the vacuum pumps. Thus, it must be made sure that the process pumps in use are suitable for this amount of powder. In order to best avoid condensation inside the pumps, purge gas is used in combination with a sophisticated temperature management.

More information about these Pfeiffer Vacuum H2O+N2 FACILITIES 2 PUMPS 2  can be found by downloading the pdf catalog and documents below. Simply open the pdf catalog below, run the pdf search (ctrl F) and search for the 805761.